[{"data":1,"prerenderedAt":3141},["ShallowReactive",2],{"page-UE4-14":3,"page-count-UE4":3140},[4,237,445,1781,2012],{"id":5,"title":6,"body":7,"date":212,"description":13,"extension":213,"meta":214,"navigation":217,"path":229,"seo":230,"stem":231,"tags":232,"__hash__":236},"blogs\u002F_legacy\u002F2015\u002F2015-07-07-ue4-projectile-visual-effects.md","UE4子弹特效",{"type":8,"value":9,"toc":199},"minimark",[10,14,17,27,30,34,37,41,57,68,92,95,98,101,107,110,118,121,126,129,132,139,144,151,157,166,175,178,181,184,187,190,193,196],[11,12,13],"p",{},"子弹使用抛体就可以实现了，但是要让其看起来更加真实，则可能需要加上一些粒子特效。",[11,15,16],{},"当前UE4版本4.8.1。",[11,18,19,20,26],{},"子弹的特效制作主要使用粒子系统进行实现，只有用于着弹效果的地方使用的是Decal Material。官方的这篇教程对于了解如何去制作一个粒子系统很有作用。原始教程地址：",[21,22,23],"a",{"href":23,"rel":24,"title":23},"https:\u002F\u002Fwiki.unrealengine.com\u002FProjectile_Visual_Effects",[25],"nofollow","（教程中有提供相关文件的下载）。",[11,28,29],{},"特效的制作基础是UE4自带的第一人称模板，不需要初学者内容。也可以直接下载文档末尾处的工程文件进行观赏，工程文件不到10M，相当的方便。",[31,32,33],"h2",{"id":33},"着弹特效",[11,35,36],{},"制作特效之前，先实际参考一下现实世界中的效果比较好。为了模拟出好的特效，观察整个过程中能量的变化非常的重要。因此，教程中对子弹的着弹效果进行观察后。将特效分为了闪光、烟雾、破片三个子特效。",[38,39,40],"h3",{"id":40},"闪光",[11,42,43,44,48,49,52,53,56],{},"闪光特效使用T_Hit.tga贴图来制作材质。材质类型修改为",[45,46,47],"strong",{},"Translucency","，同时，为了保证闪光特效始终显示在表层，将",[45,50,51],{},"Disable Depth Test","设置为",[45,54,55],{},"True","。闪光特效中示例工程中额外的添加了Near Camera Fade和Depth Fade，这样的话在子弹有射入角度时就不会依然显示一个光晕了，更加自然一些。",[11,58,59,64,65],{},[60,61],"img",{"alt":62,"src":63},"image","\u002Fwp-content\u002Fuploads\u002F2015\u002F07\u002Fimage_thumb14.png"," ",[60,66],{"alt":62,"src":67},"\u002Fwp-content\u002Fuploads\u002F2015\u002F07\u002Fimage_thumb15.png",[11,69,70,71,74,75,79,80,83,84,87,88,91],{},"新建一个粒子系统，并在",[45,72,73],{},"Required","模块中将默认发射器的材质修改为刚刚建立的材质。为了方便以后辨识，可以将发射器的名称修改为HIT。按照",[21,76,78],{"href":77},"\u002F2015-07-06-ue4-particle-official-tutorial-summary\u002F","之前的教程","中的建议，删除",[45,81,82],{},"Color Over Life","模块，替换为",[45,85,86],{},"Initial Color","与",[45,89,90],{},"Scale Color\u002FLife","模块。在模块的属性上，主要使用粒子生命周期和初始大小进行随机化来增强特效的随机性。",[38,93,94],{"id":94},"烟雾",[11,96,97],{},"第一步依然是构建材质，烟雾的材质相对复杂一些。在示例的截图中，有添加Near Camera Fade特性，但是在示例工程中该材质并没有添加。使用到的贴图分别是T_Smoke与T_S_Normal。",[11,99,100],{},"烟雾特效中，额外的使用Initial Rotation和Initial Rotation Rate来作随机化。同时添加Sphere模块对初始位置以及速度应用随机。",[11,102,103,104,106],{},"烟雾特效中，由于材质中使用了MacroUV，需要对MacroUV进行修改。点击编辑器的空白处，在粒子系统的属性中进行设置。如果不同的发射器使用的是不同的设置，也可以在",[45,105,73],{},"模块对MacroUV属性进行修改。",[38,108,109],{"id":109},"破片",[11,111,112,113,117],{},"破片效果主要使用",[21,114,116],{"href":115},"\u002F2015-07-01-ue4-particles-subuv-module\u002F","SubUV模块","进行实现。需要添加Acceleration模块进行重力模拟，Collision模块进行碰撞模拟。",[11,119,120],{},"这一部分示例工程中的材质和教程中的截图相差比较大，Near Camera Fade和Depth Fade被取消，同时用一种近似的方法生成了法线。",[11,122,123],{},[60,124],{"alt":62,"src":125},"\u002Fwp-content\u002Fuploads\u002F2015\u002F07\u002Fimage_thumb16.png",[11,127,128],{},"由于碎片较小，很难观察出有什么不同……",[31,130,131],{"id":131},"拖曳",[11,133,134,135,138],{},"拖拽特效同样通过粒子进行实现。使用的是",[45,136,137],{},"Ribbon","类型的发射器。拖拽部分使用的材质教程中没有对Panner的速度进行说明，实际情况如下：",[11,140,141],{},[60,142],{"alt":62,"src":143},"\u002Fwp-content\u002Fuploads\u002F2015\u002F07\u002Fimage_thumb17.png",[11,145,146,147,150],{},"这一部分在操作是需要注意的是，必须删除",[45,148,149],{},"Initial Velocity","模块。由于教程中没有明言，会导致结果与预期的不同。",[11,152,153,154,156],{},"还有一个示例工程的不同之处在",[45,155,73],{},"模块中：",[11,158,159,52,162,165],{},[45,160,161],{},"Screen AlignMent",[45,163,164],{},"Facing Camera Position","；",[11,167,168,52,171,174],{},[45,169,170],{},"Sort Mode",[45,172,173],{},"Distance to View","。",[31,176,177],{"id":177},"弹痕与子弹",[11,179,180],{},"弹痕的特效使用Decal Materia进行实现。",[11,182,183],{},"材质中使用快速方法生成了测试用的替代法线贴图。",[11,185,186],{},"子弹的材质没有什么特别的地方，并不是教程的重点。如果是使用球体而不是子弹的话，可以跳过子弹的材质。",[31,188,189],{"id":189},"蓝图",[11,191,192],{},"实际的对上面生成的特效进行使用测试。",[11,194,195],{},"在组件中添加Ribbon的粒子系统，修改抛体的速度和重力设置，同时勾选平面移动限制。在碰撞点生成粒子系统和Decal Materia。",[11,197,198],{},"开始调试，就能看到相当不错的子弹特效了。",{"title":200,"searchDepth":201,"depth":202,"links":203},"",2,3,[204,209,210,211],{"id":33,"depth":201,"text":33,"children":205},[206,207,208],{"id":40,"depth":202,"text":40},{"id":94,"depth":202,"text":94},{"id":109,"depth":202,"text":109},{"id":131,"depth":201,"text":131},{"id":177,"depth":201,"text":177},{"id":189,"depth":201,"text":189},"2015-07-07","md",{"layout":215,"status":216,"published":217,"author":218,"author_login":219,"author_email":220,"author_url":221,"wordpress_id":222,"wordpress_url":223,"date_gmt":224,"excerpt":225},"post","publish",true,{"display_name":219,"login":219,"email":220,"url":221},"chaoshikari","chaoshikari@gmail.com","\u002F",1397,"\u002F\u002F?p=1397","2015-07-07 09:54:58 +0000",{"type":8,"value":226},[227],[11,228,13],{},"\u002F2015-07-07-ue4-projectile-visual-effects",{"title":6,"description":13},"_legacy\u002F2015\u002F2015-07-07-ue4-projectile-visual-effects",[233,234,235],"UE4","粒子","Decal Materia","FT9OoEznMygJjKnaEZBv9Uujm4xFmKdhSdoDaUoOG5Y",{"id":238,"title":239,"body":240,"date":429,"description":244,"extension":213,"meta":430,"navigation":217,"path":439,"seo":440,"stem":441,"tags":442,"__hash__":444},"blogs\u002F_legacy\u002F2015\u002F2015-07-06-ue4-particle-official-tutorial-summary.md","UE4粒子系统官方教程总结",{"type":8,"value":241,"toc":414},[242,245,248,251,258,261,264,267,270,273,276,279,283,286,289,293,296,299,302,306,309,312,316,319,322,325,328,331,334,337,341,344,347,354,359,362,366,369,372,390,393,396,399,402,405,408,411],[11,243,244],{},"Epic官方提供的粒子特效教程涵盖的范围比较广，操作上也是由浅入深，对于帮助了解粒子系统很有作用。",[11,246,247],{},"当前UE4版本：4.8.1。",[11,249,250],{},"粒子系统这一块，虽然之前将文档大概读了一遍，但是有些概念依然比较抽象，故而按照官方教程操作了一遍。",[11,252,253,254,174],{},"原始教程地址：",[21,255,256],{"href":256,"rel":257,"title":256},"https:\u002F\u002Fwiki.unrealengine.com\u002FVisual_Effects:_Lesson_01:_Material_Particle_Color",[25],[31,259,260],{"id":260},"基础材质",[11,262,263],{},"粒子系统除了在Mesh Data Type被指定时使用的是Mesh之外，在一般情况下都会使用材质作为发射器的基本粒子。",[38,265,266],{"id":266},"材质构建",[11,268,269],{},"教程中使用的材质是Blend Mode为Translucent而Lighting Model为Unlit的，通常情况下粒子上的光照效果并不明显，使用Unlit可以有效的降低系统负担。",[11,271,272],{},"教程中使用的十字图片一时找不到原图，因而直接使用默认粒子系统的那张贴图作为制作基础。",[11,274,275],{},"基础材质的制作较为简单，基本就是将材质的颜色和alpha通道分别连接到自发光颜色和不透明度上。材质制作完成后，在发射器的Required模块将材质替换为刚刚建立的材质即可。",[11,277,278],{},"材质中使用的Particle Color参数可以使用Color Over Life进行控制，操作相对简单，没有什么特别需要注意的地方。",[38,280,282],{"id":281},"depth-fade","Depth Fade",[11,284,285],{},"使得粒子在与其他物体交集时边界不是那么的尖锐，而是在有交错时减少粒子的透明度。",[11,287,288],{},"功能实现很简单，在材质的不透明读输入之前连接上Depth Fade节点即可。",[38,290,292],{"id":291},"near-camera-fade","Near Camera Fade",[11,294,295],{},"粒子在摄像机靠近时逐渐变得透明进而消失，在游戏中比较经常用到。这一类的效果基本使用这种方法进行实现。",[11,297,298],{},"在材质中使用节点PixelDepth配合Sphere Mask。Shpere Mask用于计算距离并生成遮罩，圆心处为1，Distance处为0，根据Hardness生成过渡效果。因而，要连接到不透明度效果上的话要先进行一减操作。",[11,300,301],{},"将生成的不透明度与原有的不透明度相乘即可实现Near Camera Fade的效果。教程中Sphere Mask的参数为Radius:75，Hardness:10。",[38,303,305],{"id":304},"materia-function","Materia Function",[11,307,308],{},"材质函数用于将经常用到的材质特效独立出来，便于操作、管理和统一修改，也被用于Layered Materia的制作之中。是材质系统中比较重要的一个功能。",[11,310,311],{},"在这里实现的是对Near Camera Fade的材质函数化，因为大部分场景中的粒子都有可能会需要这个功能。可以通过增进Function Input节点来为函数提供参数输入引脚，在函数属性中选中Expose to Library就可以在材质视图的上下文菜单中直接找到这个函数了。如果选择不暴露的话，每次都必须将这个函数拖到材质中去。",[38,313,315],{"id":314},"dynamic-parameter","Dynamic Parameter",[11,317,318],{},"材质中的Dynamic Parameter节点允许粒子对材质进行动态的参数输入，需要注意的是当使用GPU粒子时，这个传入是无效的。",[11,320,321],{},"要给材质传入参数，需要使用Parameter->Dynamic模块进行相关操作。在对动态参数的名称进行修改之后，对Dynamic模块进行刷新就可以看到参数名称的更新。",[11,323,324],{},"对于一次性设定的参数，要在Dynamic模块中为参数设置Spawn Time Only，这样就只在粒子生成时进行参数生成和设置。",[38,326,327],{"id":327},"颜色控制",[11,329,330],{},"教程中建议删除默认的Color Over Life模块，改为使用Initial Color和Scale Color\u002FLife两个模块进行组合配置。",[11,332,333],{},"主要的好处在于，可以解除生成时颜色和生命周期颜色之间的关联。方便进行控制。",[11,335,336],{},"总体上操作没有什么太大的不同，其实如果没有对粒子颜色进行控制的话，可以不用进行这个操作。",[31,338,340],{"id":339},"gpu-particle","GPU Particle",[11,342,343],{},"GPU粒子的效率比CPU粒子高，虽然有一些地方的功能有所限制，但按照官方建议，在大多数情况下都应该使用GPU粒子。",[11,345,346],{},"GPU粒子在生成粒子时依然使用CPU进行，以便对粒子进行更好的控制。因此，在GPU粒子制作时，应该将CPU生成粒子的消耗考虑在内。否则极有可能成为系统的瓶颈。教程建议单次粒子爆发不要超过15k个，在通过爆发生成大量粒子时，其间隔应该在0.05~0.1以上。同时在有大量粒子生成的情况下，最好使用LOD来尽可能的降低整体的系统消耗。",[11,348,349,350,353],{},"当粒子系统中的粒子数量超过某个点之后，其对整体视觉效果的贡献并不明显。因此在粒子系统制作中应该对参数进行调整，将粒子个数控制在平衡点附近。可以通过将显示模式调整为",[45,351,352],{},"着色器复杂度","来观察粒子个数是否过多。",[11,355,356],{},[60,357],{"alt":62,"src":358},"\u002Fwp-content\u002Fuploads\u002F2015\u002F07\u002Fimage_thumb13.png",[11,360,361],{},"在这个模式中，显示为白色的区域代表其成本极高。应该对其进行调整。",[38,363,365],{"id":364},"vector-field","Vector Field",[11,367,368],{},"矢量场用于控制粒子的流向，效果上就像是场景中有风带动粒子移动一样。矢量场可以通过模块进行旋转和缩放，能够实现非常独特和真实的效果。",[11,370,371],{},"Vector Field模块只有在类型为GPU Sprites时才有效。矢量场分为Local Vector Field和Global Vector Field两种，分别作用在粒子系统的本地空间和实际场景中。",[11,373,374,375,380,384,385],{},"矢量场的制作已经完全进入了美工的领域，不再进行研究。官方的制作教程在这里：[",[21,376,379],{"href":377,"rel":378},"https:\u002F\u002Fwiki.unrealengine.com\u002FCreating_Vector_Fields_(Tutorial)%5D(",[25],"https:\u002F\u002Fwiki.unrealengine.com\u002FCreating_Vector_Fields_(Tutorial)](",[21,381,382],{"href":382,"rel":383},"https:\u002F\u002Fwiki.unrealengine.com\u002FCreating_Vector_Fields_(Tutorial",[25]," \"",[21,386,389],{"href":387,"rel":388},"https:\u002F\u002Fwiki.unrealengine.com\u002FCreating_Vector_Fields_(Tutorial)%22)%E3%80%82",[25],"https:\u002F\u002Fwiki.unrealengine.com\u002FCreating_Vector_Fields_(Tutorial)\")。",[38,391,392],{"id":392},"动态参数",[11,394,395],{},"GPU粒子不能进行动态参数传值，Dynamic模块将会失效。为了让粒子对参数进行一定程度的控制，教程中介绍了一个变通的方法。",[11,397,398],{},"那就是使用依然有效的Particle Color进行数值传递，虽然这样会导致无法对粒子的颜色进行控制，但是在没有办法进行粒子传递时还是需要这样一个替代方案的。",[38,400,401],{"id":401},"粒子碰撞",[11,403,404],{},"Collision(Scene Depth)模块用于为粒子添加碰撞功能，这个模块当前只在GPU粒子下有效。同时，这个功能必须使用Translucent的材质作为粒子的时候才会起作用。",[11,406,407],{},"可调节参数包括反弹系数、摩擦力、反应模式等。",[409,410],"hr",{},[11,412,413],{},"UE4的粒子功能很强大，提供很多用于修改的模块。感觉上作为程序的话，只要了解大概有什么功能，能够实现简单的粒子特效即可。实在有需要制作复杂的粒子时，可以参考别人做好的进行修改。",{"title":200,"searchDepth":201,"depth":202,"links":415},[416,424],{"id":260,"depth":201,"text":260,"children":417},[418,419,420,421,422,423],{"id":266,"depth":202,"text":266},{"id":281,"depth":202,"text":282},{"id":291,"depth":202,"text":292},{"id":304,"depth":202,"text":305},{"id":314,"depth":202,"text":315},{"id":327,"depth":202,"text":327},{"id":339,"depth":201,"text":340,"children":425},[426,427,428],{"id":364,"depth":202,"text":365},{"id":392,"depth":202,"text":392},{"id":401,"depth":202,"text":401},"2015-07-06",{"layout":215,"status":216,"published":217,"author":431,"author_login":219,"author_email":220,"author_url":221,"wordpress_id":432,"wordpress_url":433,"date_gmt":434,"excerpt":435},{"display_name":219,"login":219,"email":220,"url":221},1379,"\u002F\u002F?p=1379","2015-07-06 07:37:27 +0000",{"type":8,"value":436},[437],[11,438,244],{},"\u002F2015-07-06-ue4-particle-official-tutorial-summary",{"title":239,"description":244},"_legacy\u002F2015\u002F2015-07-06-ue4-particle-official-tutorial-summary",[233,234,443,365],"GPU Sprites","Q8Z_TjX1uDswg-jlR7mTVtwgWkNFLo7cfHdi4HeKs-o",{"id":446,"title":447,"body":448,"date":1766,"description":452,"extension":213,"meta":1767,"navigation":217,"path":1776,"seo":1777,"stem":1778,"tags":1779,"__hash__":1780},"blogs\u002F_legacy\u002F2015\u002F2015-07-04-ue4-beamtype-particle-module.md","UE4粒子光束类发射器及应用",{"type":8,"value":449,"toc":1751},[450,453,455,458,462,465,471,476,479,484,487,492,495,500,503,508,511,516,519,524,527,532,535,540,543,585,590,595,598,603,607,610,615,620,623,659,664,667,672,675,680,685,688,693,696,701,704,709,712,717,720,724,727,732,736,739,744,749,752,757,761,764,769,772,808,813,817,820,825,830,833,863,868,871,876,880,883,888,891,921,925,927,931,934,939,944,947,952,955,960,963,968,971,976,979,984,987,992,995,1000,1003,1008,1011,1016,1019,1024,1027,1032,1035,1040,1043,1048,1051,1056,1059,1064,1067,1072,1075,1080,1083,1088,1091,1095,1097,1101,1104,1108,1113,1116,1168,1173,1176,1181,1184,1188,1191,1196,1199,1204,1207,1249,1254,1257,1262,1265,1270,1273,1278,1281,1285,1287,1291,1294,1298,1303,1306,1349,1354,1357,1362,1365,1369,1372,1377,1380,1385,1388,1426,1431,1434,1439,1442,1447,1450,1455,1457,1462,1465,1468,1471,1480,1483,1486,1496,1499,1504,1507,1510,1513,1518,1521,1638,1641,1646,1649,1652,1655,1737,1740,1745,1748],[11,451,452],{},"光束类粒子广泛应用于激光、闪电等有传输路径的效果的模拟。 光束类发射器将粒子由源点到目标点之间相互连接并形成一个流。",[11,454,247],{},[11,456,457],{},"光束粒子的使用首先要将类型模块改为Beam Data Type，然后根据需要添加模块和修改属性。",[31,459,461],{"id":460},"beam-data-type","Beam Data Type",[11,463,464],{},"光束粒子类型模块，添加了这个模块之后发射器将会变成光束型。",[11,466,467],{},[468,469,470],"em",{},"Beam",[11,472,473],{},[45,474,475],{},"Beam Method",[11,477,478],{},"光束方法。有三种。Distance为沿着X轴方向的光束，Target为两点之间的光束，Branch暂时没有功能。",[11,480,481],{},[45,482,483],{},"Texture Tile",[11,485,486],{},"调整粒子材质的平铺数，只对第一套UV有效。当Texture Tile Distance被启用时会被其设置覆盖。",[11,488,489],{},[45,490,491],{},"Texutre Tile Distance",[11,493,494],{},"每一个粒子材质平铺的宽度，为0时关闭设置。",[11,496,497],{},[45,498,499],{},"Sheets",[11,501,502],{},"沿着光束所渲染的面片的数量。",[11,504,505],{},[45,506,507],{},"Max Beam Count",[11,509,510],{},"光束的数量上限。",[11,512,513],{},[45,514,515],{},"Speed",[11,517,518],{},"光束的速度，为0时则直接跳转。",[11,520,521],{},[45,522,523],{},"Interpolation Points",[11,525,526],{},"当这个设置大于0时，将会在源点和目标点之间进行插值，可以增强噪波的特效。",[11,528,529],{},[45,530,531],{},"Always On",[11,533,534],{},"当打开这个开关时，发射器将会保证始终有粒子是存活的。",[11,536,537],{},[45,538,539],{},"Up Vector Step Size",[11,541,542],{},"决定光束的Up向量的方法",[544,545,546,557],"table",{},[547,548,549],"thead",{},[550,551,552,555],"tr",{},[553,554],"th",{},[553,556],{},[558,559,560,569,577],"tbody",{},[550,561,562,566],{},[563,564,565],"td",{},"0",[563,567,568],{},"在光束的每一个点进行计算",[550,570,571,574],{},[563,572,573],{},"1",[563,575,576],{},"在光束的开始点计算并应用到所有点",[550,578,579,582],{},[563,580,581],{},"N",[563,583,584],{},"插值N个点并计算（当前未实现）",[11,586,587],{},[468,588,589],{},"Branching",[11,591,592],{},[45,593,594],{},"Branch Parent Name",[11,596,597],{},"分支的父发射点名称，必须在同一个粒子系统内。Beam Method为Branch才可用，当前无效。",[11,599,600],{},[468,601,602],{},"Distance",[11,604,605],{},[45,606,602],{},[11,608,609],{},"光束的传播距离，Beam Method为Distance时有效。",[11,611,612],{},[468,613,614],{},"Taper",[11,616,617],{},[45,618,619],{},"Taper Method",[11,621,622],{},"光束随着长度变少的方式。",[544,624,625,633],{},[547,626,627],{},[550,628,629,631],{},[553,630],{},[553,632],{},[558,634,635,643,651],{},[550,636,637,640],{},[563,638,639],{},"None",[563,641,642],{},"光束不会变少",[550,644,645,648],{},[563,646,647],{},"Full",[563,649,650],{},"从源到目标点之间变少，无视长度，相对计算。",[550,652,653,656],{},[563,654,655],{},"Partial",[563,657,658],{},"从源到位置之间变少，源为0，位置点为1",[11,660,661],{},[45,662,663],{},"Taper Factor",[11,665,666],{},"光束变少因子。当使用曲线编辑器时，时间轴0.0代表光束的源头，时间轴1.0代表目标点处。",[11,668,669],{},[45,670,671],{},"Taper Scale",[11,673,674],{},"光束变少缩放。缩放为Taper Factor与Taper Scale的乘积。",[11,676,677],{},[468,678,679],{},"Rendering",[11,681,682],{},[45,683,684],{},"Render Geometry",[11,686,687],{},"是否渲染光束的几何体。",[11,689,690],{},[45,691,692],{},"Render Direct Line",[11,694,695],{},"调试用。在源点和目标点之间绘制一条线。",[11,697,698],{},[45,699,700],{},"Render Lines",[11,702,703],{},"调试用。沿着光束渲染生成线。",[11,705,706],{},[45,707,708],{},"Render Tessellation",[11,710,711],{},"调试用。绘制源和目标之间的细分路径。",[11,713,714],{},[468,715,716],{},"Cascade",[11,718,719],{},"通用编辑器属性",[31,721,723],{"id":722},"beam-modules","Beam Modules",[11,725,726],{},"当前光束发射器共有4种模块可添加并用于配置光束发射器表现：",[11,728,729],{},[60,730],{"alt":62,"src":731},"\u002Fwp-content\u002Fuploads\u002F2015\u002F07\u002Fimage_thumb7.png",[38,733,735],{"id":734},"beam-modifier","Beam Modifier",[11,737,738],{},"光束修改器。用于修改光束的源点或目标点的属性。",[11,740,741],{},[468,742,743],{},"Modifier",[11,745,746],{},[45,747,748],{},"Modifier Type",[11,750,751],{},"设定修改器的修改目标。Source为源点，Target为目标点。",[11,753,754],{},[468,755,756],{},"Position",[11,758,759],{},[45,760,756],{},[11,762,763],{},"修改位置值，可锁定坐标。",[11,765,766],{},[45,767,768],{},"Position Options",[11,770,771],{},"与Position属性关联的选项",[544,773,774,782],{},[547,775,776],{},[550,777,778,780],{},[553,779],{},[553,781],{},[558,783,784,792,800],{},[550,785,786,789],{},[563,787,788],{},"Modify",[563,790,791],{},"选中才应用修改",[550,793,794,797],{},[563,795,796],{},"Scale",[563,798,799],{},"选中后会将当前的设置缩放到指定的长度，而不是使用修改后的长度进行计算",[550,801,802,805],{},[563,803,804],{},"Lock",[563,806,807],{},"选中是粒子生命周期中该数值将被锁定",[11,809,810],{},[468,811,812],{},"Tangent",[11,814,815],{},[45,816,812],{},[11,818,819],{},"修改切线，可锁定坐标。通过切线来决定运算基础线的弧度。",[11,821,822],{},[60,823],{"alt":62,"src":824},"\u002Fwp-content\u002Fuploads\u002F2015\u002F07\u002Fimage_thumb8.png",[11,826,827],{},[45,828,829],{},"Tangent Options",[11,831,832],{},"与Tangent属性关联的选项",[544,834,835,843],{},[547,836,837],{},[550,838,839,841],{},[553,840],{},[553,842],{},[558,844,845,851,857],{},[550,846,847,849],{},[563,848,788],{},[563,850,791],{},[550,852,853,855],{},[563,854,796],{},[563,856,799],{},[550,858,859,861],{},[563,860,804],{},[563,862,807],{},[11,864,865],{},[45,866,867],{},"Absolute Tangent",[11,869,870],{},"在世界空间中使用绝对切线。",[11,872,873],{},[468,874,875],{},"Strength",[11,877,878],{},[45,879,875],{},[11,881,882],{},"修改强度。添加之后会使得光束有一个动态的移动效果，类似于给点加上受力。对开启了Tangent修改的光束影响极大。",[11,884,885],{},[45,886,887],{},"Strength Options",[11,889,890],{},"与Strength属性关联的选项",[544,892,893,901],{},[547,894,895],{},[550,896,897,899],{},[553,898],{},[553,900],{},[558,902,903,909,915],{},[550,904,905,907],{},[563,906,788],{},[563,908,791],{},[550,910,911,913],{},[563,912,796],{},[563,914,799],{},[550,916,917,919],{},[563,918,804],{},[563,920,807],{},[11,922,923],{},[468,924,716],{},[11,926,719],{},[38,928,930],{"id":929},"noise","Noise",[11,932,933],{},"在光束上加上噪波影响的模块。",[11,935,936],{},[468,937,938],{},"Low Freq",[11,940,941],{},[45,942,943],{},"Low Freq Enabled",[11,945,946],{},"是否打开低频噪波",[11,948,949],{},[45,950,951],{},"Frequency",[11,953,954],{},"噪波的频率",[11,956,957],{},[45,958,959],{},"Frequency Low Range",[11,961,962],{},"噪波频率下界，当非0有效。",[11,964,965],{},[45,966,967],{},"Noise Range",[11,969,970],{},"噪波范围。用于计算噪点的分布，使用曲线时，0为第一点，而1为目标点。通常为Uniform形式，以提供一个随机的范围。",[11,972,973],{},[45,974,975],{},"Noise Range Scale",[11,977,978],{},"噪波范围缩放。",[11,980,981],{},[45,982,983],{},"NRScale Emitter Time",[11,985,986],{},"当打开时噪波范围缩放将会使用发射器时间，否则使用粒子时间。",[11,988,989],{},[45,990,991],{},"Noise Speed",[11,993,994],{},"噪波速度，噪点的移动速度。只有Smooth打开时才有效。",[11,996,997],{},[45,998,999],{},"Smooth",[11,1001,1002],{},"打开时会在噪点发生之后会进行平滑的移动。",[11,1004,1005],{},[45,1006,1007],{},"Noise Lock Radius",[11,1009,1010],{},"噪波锁定半径。防止生成的噪点过于接近。",[11,1012,1013],{},[45,1014,1015],{},"Oscillate",[11,1017,1018],{},"噪波摆动。如果开启，则噪点在发射线两端摆动。",[11,1020,1021],{},[45,1022,1023],{},"Noise Lock Time",[11,1025,1026],{},"噪波锁定时间。亦即噪点生成之后停留多久进行下一次噪点生成。",[11,1028,1029],{},[45,1030,1031],{},"Noise Tension",[11,1033,1034],{},"噪波张力。随着这个设置的增强，噪点之间的细分点将会受到更大的张力影响。轨迹会变得更尖锐。",[11,1036,1037],{},[45,1038,1039],{},"Use Noise Tangent",[11,1041,1042],{},"使用噪波切线。如果开启则会计算每一个噪点的切线。",[11,1044,1045],{},[45,1046,1047],{},"Noise Tangent Strenth",[11,1049,1050],{},"噪波切线强度。这个值越大，将会使得沿着光束的插值点受到切线方向的影响越大。当这个值为0时，Noise Tension几乎不会对轨迹造成影响。",[11,1052,1053],{},[45,1054,1055],{},"Noise Tessellagtion",[11,1057,1058],{},"在噪点之间插值细分的数量。使得噪波之后的线条轨迹变得平滑。",[11,1060,1061],{},[45,1062,1063],{},"Target Noise",[11,1065,1066],{},"打开时将会应用噪波到目标点。光束的终点将在设置的目标点附近进行随机。",[11,1068,1069],{},[45,1070,1071],{},"Frequency Distance",[11,1073,1074],{},"噪点距离。为0时使用Frequency Low Range~Frequency来决定噪点的频率。不为零时则根据Frequency的值与这个值来共同决定分布，作用在于减少较短的光束上的噪点数，同时保证长光束上的噪点。",[11,1076,1077],{},[45,1078,1079],{},"Apply Noise Scale",[11,1081,1082],{},"噪波缩放开关。",[11,1084,1085],{},[45,1086,1087],{},"Noise Scale",[11,1089,1090],{},"噪波缩放因子。决定噪点远离发射线的波幅比例，在Noise Range的基础产生影响，为0则无可见的噪波效果。",[11,1092,1093],{},[468,1094,716],{},[11,1096,719],{},[38,1098,1100],{"id":1099},"source","Source",[11,1102,1103],{},"源点，当未指定这个模块时发射器位置将会作为源点。",[11,1105,1106],{},[468,1107,1100],{},[11,1109,1110],{},[45,1111,1112],{},"Source Method",[11,1114,1115],{},"源点方式。",[544,1117,1118,1126],{},[547,1119,1120],{},[550,1121,1122,1124],{},[553,1123],{},[553,1125],{},[558,1127,1128,1136,1144,1152,1160],{},[550,1129,1130,1133],{},[563,1131,1132],{},"Default",[563,1134,1135],{},"使用Source的设定值",[550,1137,1138,1141],{},[563,1139,1140],{},"UserSet",[563,1142,1143],{},"用户指定，常用于武器",[550,1145,1146,1149],{},[563,1147,1148],{},"Emitter",[563,1150,1151],{},"使用发射器位置",[550,1153,1154,1157],{},[563,1155,1156],{},"Particle",[563,1158,1159],{},"使用其他发射器的粒子",[550,1161,1162,1165],{},[563,1163,1164],{},"Actor",[563,1166,1167],{},"使用Actor对象位置",[11,1169,1170],{},[45,1171,1172],{},"Source Name",[11,1174,1175],{},"源名称。在Source Method为Particle和Acotr时有效，如果没有对应，则会使用Source的设定值。",[11,1177,1178],{},[45,1179,1180],{},"Source Absolute",[11,1182,1183],{},"使用源点绝对位置，亦即不进行变换。",[11,1185,1186],{},[45,1187,1100],{},[11,1189,1190],{},"源点位置。当Source Method为Default时有效。采用其他设定却无效时也会使用这个值。",[11,1192,1193],{},[45,1194,1195],{},"Lock Source",[11,1197,1198],{},"在粒子生命周期中锁定源点。",[11,1200,1201],{},[45,1202,1203],{},"Source Tangent Method",[11,1205,1206],{},"源切线方法。",[544,1208,1209,1217],{},[547,1210,1211],{},[550,1212,1213,1215],{},[553,1214],{},[553,1216],{},[558,1218,1219,1227,1234,1242],{},[550,1220,1221,1224],{},[563,1222,1223],{},"Direct",[563,1225,1226],{},"使用源与目标的连线",[550,1228,1229,1231],{},[563,1230,1140],{},[563,1232,1233],{},"用户指定",[550,1235,1236,1239],{},[563,1237,1238],{},"Distribution",[563,1240,1241],{},"使用SourceTangent的设定值",[550,1243,1244,1246],{},[563,1245,1148],{},[563,1247,1248],{},"使用发射器的朝向",[11,1250,1251],{},[45,1252,1253],{},"Source Tangent",[11,1255,1256],{},"源切线的设定值。",[11,1258,1259],{},[45,1260,1261],{},"Lock Source Tangent",[11,1263,1264],{},"在粒子生命周期中锁定源切线值。",[11,1266,1267],{},[45,1268,1269],{},"Source Strength",[11,1271,1272],{},"切线力量强度。",[11,1274,1275],{},[45,1276,1277],{},"Lock Source Strength",[11,1279,1280],{},"在粒子生命周期中锁定切线强度。",[11,1282,1283],{},[468,1284,716],{},[11,1286,719],{},[38,1288,1290],{"id":1289},"target","Target",[11,1292,1293],{},"目标点。",[11,1295,1296],{},[468,1297,1290],{},[11,1299,1300],{},[45,1301,1302],{},"Target Method",[11,1304,1305],{},"目标点方式。",[544,1307,1308,1316],{},[547,1309,1310],{},[550,1311,1312,1314],{},[553,1313],{},[553,1315],{},[558,1317,1318,1325,1331,1337,1343],{},[550,1319,1320,1322],{},[563,1321,1132],{},[563,1323,1324],{},"使用Target的设定值",[550,1326,1327,1329],{},[563,1328,1140],{},[563,1330,1143],{},[550,1332,1333,1335],{},[563,1334,1148],{},[563,1336,1151],{},[550,1338,1339,1341],{},[563,1340,1156],{},[563,1342,1159],{},[550,1344,1345,1347],{},[563,1346,1164],{},[563,1348,1167],{},[11,1350,1351],{},[45,1352,1353],{},"Target Name",[11,1355,1356],{},"目标名称。在Target Method为Particle和Acotr时有效，如果没有对应，则会使用Target的设定值。",[11,1358,1359],{},[45,1360,1361],{},"Target Absolute",[11,1363,1364],{},"使用目标点绝对位置，亦即不进行变换。",[11,1366,1367],{},[45,1368,1290],{},[11,1370,1371],{},"目标点位置。当Target Method为Default时有效。采用其他设定却无效时也会使用这个值。",[11,1373,1374],{},[45,1375,1376],{},"Lock Target",[11,1378,1379],{},"在粒子生命周期中锁定目标点。",[11,1381,1382],{},[45,1383,1384],{},"Target Tangent Method",[11,1386,1387],{},"目标切线方法。",[544,1389,1390,1398],{},[547,1391,1392],{},[550,1393,1394,1396],{},[553,1395],{},[553,1397],{},[558,1399,1400,1407,1413,1420],{},[550,1401,1402,1404],{},[563,1403,1223],{},[563,1405,1406],{},"使用目标与目标的连线",[550,1408,1409,1411],{},[563,1410,1140],{},[563,1412,1233],{},[550,1414,1415,1417],{},[563,1416,1238],{},[563,1418,1419],{},"使用TargetTangent的设定值",[550,1421,1422,1424],{},[563,1423,1148],{},[563,1425,1248],{},[11,1427,1428],{},[45,1429,1430],{},"Target Tangent",[11,1432,1433],{},"目标切线的设定值。",[11,1435,1436],{},[45,1437,1438],{},"Lock Target Tangent",[11,1440,1441],{},"在粒子生命周期中锁定目标切线值。",[11,1443,1444],{},[45,1445,1446],{},"Target Strength",[11,1448,1449],{},"切线强度。",[11,1451,1452],{},[45,1453,1454],{},"Lock Target Strength",[11,1456,1280],{},[11,1458,1459],{},[45,1460,1461],{},"Lock Radius",[11,1463,1464],{},"光束的结束点被锁定在目标点的范围内，当光束有Speed设定时用到。",[31,1466,1467],{"id":1467},"应用",[11,1469,1470],{},"光束粒子发射器的模块和参数都比较多，不在实际中应用很难掌握其具体含义。",[11,1472,1473,1474,1479],{},"参照官方社区的教程",[21,1475,1478],{"href":1476,"rel":1477},"https:\u002F\u002Fwiki.unrealengine.com\u002FBeam_Particle_(Tutorial)",[25],"Beam Particle (Tutorial)","进行操作，是一个类似于放电现象的光束粒子。",[38,1481,1482],{"id":1482},"材质",[11,1484,1485],{},"第一步与其他粒子系统一样，是制作材质。材质用到了两张贴图：",[11,1487,1488,64,1492],{},[60,1489],{"alt":1490,"src":1491},"BeamPulse","\u002Fwp-content\u002Fuploads\u002F2015\u002F07\u002FBeamPulse_thumb.png",[60,1493],{"alt":1494,"src":1495},"BaseBeam","\u002Fwp-content\u002Fuploads\u002F2015\u002F07\u002FBaseBeam_thumb.png",[11,1497,1498],{},"将材质导入UE4制作成为如下的贴图：",[11,1500,1501],{},[60,1502],{"alt":62,"src":1503},"\u002Fwp-content\u002Fuploads\u002F2015\u002F07\u002Fimage_thumb9.png",[11,1505,1506],{},"Panner节点在放置之后注意设置x轴速度，默认的情况下是不会进行平移的。",[38,1508,1509],{"id":1509},"粒子系统",[11,1511,1512],{},"材质创建完成后，新建一个粒子系统并将默认发射器的材质指定为刚刚创建的材质。同时为发射器添加Beam Data Type模块。",[11,1514,1515],{},[60,1516],{"alt":62,"src":1517},"\u002Fwp-content\u002Fuploads\u002F2015\u002F07\u002Fimage_thumb10.png",[11,1519,1520],{},"然后参照下表修改各个模块的属性：",[544,1522,1523,1533],{},[547,1524,1525],{},[550,1526,1527,1529,1531],{},[553,1528],{},[553,1530],{},[553,1532],{},[558,1534,1535,1546,1557,1567,1578,1588,1599,1609,1618,1628],{},[550,1536,1537,1540,1543],{},[563,1538,1539],{},"属性",[563,1541,1542],{},"值",[563,1544,1545],{},"目的",[550,1547,1548,1553,1555],{},[563,1549,1550],{},[45,1551,1552],{},"Lifetime Module",[563,1554],{},[563,1556],{},[550,1558,1559,1562,1564],{},[563,1560,1561],{},"Lifetime",[563,1563,565],{},[563,1565,1566],{},"使得光束粒子一直存在。",[550,1568,1569,1574,1576],{},[563,1570,1571],{},[45,1572,1573],{},"Beam Data Module",[563,1575],{},[563,1577],{},[550,1579,1580,1582,1585],{},[563,1581,475],{},[563,1583,1584],{},"PEB2M_Distance",[563,1586,1587],{},"光束将沿着X轴方向发射，便于观察效果",[550,1589,1590,1593,1596],{},[563,1591,1592],{},"Texture Tile Distance",[563,1594,1595],{},"500",[563,1597,1598],{},"光束上贴图的长度为500单位，与下面的长度1000相匹配，使得光束上有两个“点”在流动",[550,1600,1601,1603,1606],{},[563,1602,507],{},[563,1604,1605],{},"3",[563,1607,1608],{},"光束个数为3，便于之后添加噪波效果。",[550,1610,1611,1613,1615],{},[563,1612,515],{},[563,1614,565],{},[563,1616,1617],{},"粒子立刻到达目标点",[550,1619,1620,1622,1625],{},[563,1621,523],{},[563,1623,1624],{},"50",[563,1626,1627],{},"加强下一步噪波的特效",[550,1629,1630,1632,1635],{},[563,1631,602],{},[563,1633,1634],{},"1000",[563,1636,1637],{},"光束的发射距离为1000，使得光束足够长",[11,1639,1640],{},"上面的属性设定完成后粒子系统的效果类似下图。",[11,1642,1643],{},[60,1644],{"alt":62,"src":1645},"\u002Fwp-content\u002Fuploads\u002F2015\u002F07\u002Fimage_thumb11.png",[38,1647,1648],{"id":1648},"增加噪波",[11,1650,1651],{},"噪波可以使得光束拥有更多的随机效果，而不是单调的笔直的路径。",[11,1653,1654],{},"噪波模块的属性设置如下：",[544,1656,1657,1667],{},[547,1658,1659],{},[550,1660,1661,1663,1665],{},[553,1662],{},[553,1664],{},[553,1666],{},[558,1668,1669,1677,1687,1697,1706,1716,1727],{},[550,1670,1671,1673,1675],{},[563,1672,1539],{},[563,1674,1542],{},[563,1676,1545],{},[550,1678,1679,1681,1684],{},[563,1680,951],{},[563,1682,1683],{},"30",[563,1685,1686],{},"噪波频率",[550,1688,1689,1691,1694],{},[563,1690,943],{},[563,1692,1693],{},"选中",[563,1695,1696],{},"打开噪波特效",[550,1698,1699,1701,1704],{},[563,1700,967],{},[563,1702,1703],{},"Vector Uniform distribution",[563,1705],{},[550,1707,1708,1711,1714],{},[563,1709,1710],{},"Min:( 0, -50, -50) Max:( 0, 50, 50)",[563,1712,1713],{},"噪点能够离开光束的范围",[563,1715],{},[550,1717,1718,1721,1724],{},[563,1719,1720],{},"Noise Tessellation",[563,1722,1723],{},"10",[563,1725,1726],{},"使得噪波之后的光束之间的连接变得平滑",[550,1728,1729,1731,1734],{},[563,1730,1071],{},[563,1732,1733],{},"100",[563,1735,1736],{},"获得合理的噪点个数",[11,1738,1739],{},"最终效果如下：",[11,1741,1742],{},[60,1743],{"alt":62,"src":1744},"\u002Fwp-content\u002Fuploads\u002F2015\u002F07\u002Fimage_thumb12.png",[38,1746,1747],{"id":1747},"属性测试",[11,1749,1750],{},"关于Beam Modifier模块中的Scale，当发射距离为1000时，如果应用修改器将发射点移动到10000。那么在没有启用Scale时，按照设定每100会有一个噪点。当Scale启用时，10000的长度上依然是10个噪点。 对于可以使用Curv型分布的变量，如果改用Curv型的话可以实现很多不同的效果，由于现在还没有具体使用到，就没有一一的去测试了。",{"title":200,"searchDepth":201,"depth":202,"links":1752},[1753,1754,1760],{"id":460,"depth":201,"text":461},{"id":722,"depth":201,"text":723,"children":1755},[1756,1757,1758,1759],{"id":734,"depth":202,"text":735},{"id":929,"depth":202,"text":930},{"id":1099,"depth":202,"text":1100},{"id":1289,"depth":202,"text":1290},{"id":1467,"depth":201,"text":1467,"children":1761},[1762,1763,1764,1765],{"id":1482,"depth":202,"text":1482},{"id":1509,"depth":202,"text":1509},{"id":1648,"depth":202,"text":1648},{"id":1747,"depth":202,"text":1747},"2015-07-04",{"layout":215,"status":216,"published":217,"author":1768,"author_login":219,"author_email":220,"author_url":221,"wordpress_id":1769,"wordpress_url":1770,"date_gmt":1771,"excerpt":1772},{"display_name":219,"login":219,"email":220,"url":221},1367,"\u002F\u002F?p=1367","2015-07-04 05:24:03 +0000",{"type":8,"value":1773},[1774],[11,1775,452],{},"\u002F2015-07-04-ue4-beamtype-particle-module",{"title":447,"description":452},"_legacy\u002F2015\u002F2015-07-04-ue4-beamtype-particle-module",[233,234,470],"a__oXoVRCC9pe-Fhjs6Jbix_E7m_yztyrVJCxWFD8nM",{"id":1782,"title":1783,"body":1784,"date":1996,"description":1788,"extension":213,"meta":1997,"navigation":217,"path":2006,"seo":2007,"stem":2008,"tags":2009,"__hash__":2011},"blogs\u002F_legacy\u002F2015\u002F2015-07-01-ue4-particles-subuv-module.md","UE4粒子SubUV模块属性及应用",{"type":8,"value":1785,"toc":1986},[1786,1789,1792,1795,1799,1802,1807,1811,1814,1819,1824,1827,1831,1834,1839,1844,1847,1852,1855,1860,1863,1868,1872,1875,1877,1885,1888,1891,1897,1900,1903,1908,1911,1916,1919,1922,1927,1930,1935,1937,1940,1945,1948,1951,1956,1959,1962,1965,1968,1973,1975,1978,1981,1983],[11,1787,1788],{},"SubUV模块使得粒子可以从一张排布了很多帧图片的贴图中读取出帧来实现特效。",[11,1790,1791],{},"当前UE4版本为4.8.1。",[11,1793,1794],{},"SubUV模块只有在发射器的Required模块中的Interpolation Method属性不为None时才是有效的，这个属性在Sub UV分类中。该分类下的其他属性也用于对SubUV模块的效果的控制和调节。",[31,1796,1798],{"id":1797},"subimage-index","SubImage Index",[11,1800,1801],{},"子图像索引基于浮点型分布来选择子图像，默认的坐标顺序是从左上角到右下角，横轴优先。",[11,1803,1804],{},[468,1805,1806],{},"SubUV",[11,1808,1809],{},[45,1810,1798],{},[11,1812,1813],{},"一个浮点型分布，用于决定子图像的选取。选取数值时使用相对时间作为参数。在设定数值时，要稍微高于实际数值。如目标数值是4，则设定为4.1。",[11,1815,1816],{},[468,1817,1818],{},"Realtime",[11,1820,1821],{},[45,1822,1823],{},"Use Real Time",[11,1825,1826],{},"是否进行实时播放。当打开时，动画效果将会无视游戏中的慢动作而实时播放。",[31,1828,1830],{"id":1829},"subuv-movie","SubUV Movie",[11,1832,1833],{},"子UV动画循环的对子图像进行播放，效果与flipbook类似。",[11,1835,1836],{},[468,1837,1838],{},"FlipBook",[11,1840,1841],{},[45,1842,1843],{},"Use Emitter Time",[11,1845,1846],{},"当打开时，将会使用发射器的时间来计算帧率。关闭时则使用粒子的相对时间。",[11,1848,1849],{},[45,1850,1851],{},"Frame Rate",[11,1853,1854],{},"浮点型分布，帧率。",[11,1856,1857],{},[45,1858,1859],{},"Starting Frame",[11,1861,1862],{},"动画的开始帧，1为第一帧，0表示随机初始帧。如果这个值大于最大帧数的话，则会使用最后一帧。",[11,1864,1865],{},[468,1866,1867],{},"RealTime",[11,1869,1870],{},[45,1871,1823],{},[11,1873,1874],{},"打开后将会无视游戏中的慢动作设定，依然实时进行动画播放。",[31,1876,1467],{"id":1467},[11,1878,1879,1880,174],{},"SubUV的使用需要一张拼贴图，上面所有的“帧”的大小必须是相同的。这里参考的是官方教程：",[21,1881,1884],{"href":1882,"rel":1883},"https:\u002F\u002Fwiki.unrealengine.com\u002FSubUV_Particle_(Tutorial)",[25],"SubUV Particle (Tutorial)",[38,1886,1887],{"id":1887},"构建材质",[11,1889,1890],{},"操作的第一步是将拼贴图制作成为粒子系统使用的材质。",[11,1892,1893],{},[60,1894],{"alt":1895,"src":1896},"SubUV_Texture","\u002Fwp-content\u002Fuploads\u002F2015\u002F07\u002FSubUV_Texture_thumb.png",[11,1898,1899],{},"将图片导入UE4，新建一个材质。并将这个贴图放入材质中。",[11,1901,1902],{},"材质的输出属性中，将Shading Model改为Unlit。这一步的主要作用应该是关闭光照以减少不必要的系统运算量消耗，就算不进行这个操作对演示的结果也不会产生可目视识别的影响。",[11,1904,1905],{},[60,1906],{"alt":62,"src":1907},"\u002Fwp-content\u002Fuploads\u002F2015\u002F07\u002Fimage_thumb.png",[11,1909,1910],{},"将贴图乘上一个数值之后连接到自发光上，以便能够更好的观察到图形。",[11,1912,1913],{},[60,1914],{"alt":62,"src":1915},"\u002Fwp-content\u002Fuploads\u002F2015\u002F07\u002Fimage_thumb1.png",[38,1917,116],{"id":1918},"subuv模块",[11,1920,1921],{},"材质完成后首先在粒子系统默认发射器的Required模块中将材质替换为刚刚制作的材质。",[11,1923,1924],{},[60,1925],{"alt":62,"src":1926},"\u002Fwp-content\u002Fuploads\u002F2015\u002F07\u002Fimage_thumb2.png",[11,1928,1929],{},"接着，设置SubUV相关属性，由于是2x2的图形则分别设置2，插值模型为Linear_Blend。",[11,1931,1932],{},[60,1933],{"alt":62,"src":1934},"\u002Fwp-content\u002Fuploads\u002F2015\u002F07\u002Fimage_thumb3.png",[11,1936,1798],{},[11,1938,1939],{},"在发射器中添加SubImage Index模块，并对属性进行设置：",[11,1941,1942],{},[60,1943],{"alt":62,"src":1944},"\u002Fwp-content\u002Fuploads\u002F2015\u002F07\u002Fimage_thumb4.png",[11,1946,1947],{},"修改处为点1的In Val为0.75，Out Val为3.01。也可以点击模块名右边的绿色图标按钮，这样就可以在曲线编辑器中对其进行拖动和可视化修改了。",[11,1949,1950],{},"这样就完成了，效果如下：",[11,1952,1953],{},[60,1954],{"alt":62,"src":1955},"\u002Fwp-content\u002Fuploads\u002F2015\u002F07\u002Fimage_thumb5.png",[38,1957,1830],{"id":1958},"subuv-movie-1",[11,1960,1961],{},"新建一个发射器，并关闭第一个发射器的显示。与上面一样的先修改Required中的Sub UV属性，然后添加SubUV Movie模块。",[11,1963,1964],{},"添加上之后就能看到效果，粒子会不断的播放1～4的动画。",[11,1966,1967],{},"由于默认帧率是30，很难进行效果的观察，可以将帧率降到2，就能看到帧动画的播放了。",[11,1969,1970],{},[60,1971],{"alt":62,"src":1972},"\u002Fwp-content\u002Fuploads\u002F2015\u002F07\u002Fimage_thumb6.png",[38,1974,1747],{"id":1747},[11,1976,1977],{},"经过测试，可以发现Interpolation Method对动画效果的影响中，Linear和Random有很大的区别。在启用了Random的插值方法之后，Sub UV动画将不会再随着粒子时间而改变。而是在一开始的时候进行随机。可见，这里的Linear并不是单纯的指线性插值，而是指的由粒子的生命周期的相对时间进行插值。",[11,1979,1980],{},"插值方法为Random类时，Random Image Changes才会发生作用。在SubImage Index中可以指定生命周期中子图形的改变次数，SubUV Movie则是重新开启动画的播放。",[409,1982],{},[11,1984,1985],{},"目前来看，SubUV模块适用于需要子图像进行粒子显示效果控制的情况，在有相应的美工资源的情况下，可以减少使用代码生成相应效果的生产时间和运行时间。也可以将一些2D游戏的资源哪来做子图像粒子效果，说不定会有意想不到的效果～",{"title":200,"searchDepth":201,"depth":202,"links":1987},[1988,1989,1990],{"id":1797,"depth":201,"text":1798},{"id":1829,"depth":201,"text":1830},{"id":1467,"depth":201,"text":1467,"children":1991},[1992,1993,1994,1995],{"id":1887,"depth":202,"text":1887},{"id":1918,"depth":202,"text":116},{"id":1958,"depth":202,"text":1830},{"id":1747,"depth":202,"text":1747},"2015-07-01",{"layout":215,"status":216,"published":217,"author":1998,"author_login":219,"author_email":220,"author_url":221,"wordpress_id":1999,"wordpress_url":2000,"date_gmt":2001,"excerpt":2002},{"display_name":219,"login":219,"email":220,"url":221},1345,"\u002F\u002F?p=1345","2015-07-01 02:15:36 +0000",{"type":8,"value":2003},[2004],[11,2005,1788],{},"\u002F2015-07-01-ue4-particles-subuv-module",{"title":1783,"description":1788},"_legacy\u002F2015\u002F2015-07-01-ue4-particles-subuv-module",[233,234,2010],"Sub UV","JEocQfR6MRMEZjVEdN_S-x09BYGdHXvcjfI66nw9Gao",{"id":2013,"title":2014,"body":2015,"date":3125,"description":2019,"extension":213,"meta":3126,"navigation":217,"path":3135,"seo":3136,"stem":3137,"tags":3138,"__hash__":3139},"blogs\u002F_legacy\u002F2015\u002F2015-06-30-ue4-particle-basics.md","UE4粒子系统基础属性整理",{"type":8,"value":2016,"toc":3117},[2017,2020,2022,2025,2033,2036,2040,2043,2048,2053,2056,2061,2064,2069,2072,2077,2080,2085,2088,2093,2096,2101,2104,2109,2112,2117,2120,2125,2128,2133,2136,2141,2144,2149,2152,2155,2160,2165,2168,2172,2175,2180,2183,2188,2196,2201,2204,2209,2212,2217,2220,2225,2228,2233,2236,2241,2244,2249,2254,2257,2261,2264,2268,2273,2276,2281,2284,2289,2292,2297,2300,2305,2308,2312,2315,2320,2323,2328,2331,2336,2339,2343,2346,2350,2355,2358,2363,2366,2370,2373,2378,2381,2384,2388,2391,2395,2398,2403,2406,2411,2414,2419,2422,2427,2430,2490,2495,2498,2503,2506,2511,2514,2518,2521,2572,2577,2580,2585,2588,2593,2596,2601,2604,2609,2612,2617,2624,2629,2632,2637,2640,2644,2649,2652,2657,2660,2665,2671,2676,2679,2683,2689,2694,2697,2748,2753,2756,2761,2764,2769,2772,2777,2780,2784,2787,2791,2796,2799,2804,2807,2812,2815,2883,2888,2893,2896,2932,2937,2940,2945,2947,2952,2955,2958,2962,2965,2969,2974,2977,2982,2985,2990,2993,2998,3001,3006,3009,3014,3017,3045,3050,3053,3089,3094,3097,3102,3105,3109,3112,3114],[11,2018,2019],{},"要在游戏中实现炫丽的特效，最有效的方法之一就是使用粒子系统。",[11,2021,1791],{},[11,2023,2024],{},"UE4拥有一个非常强大的模块化粒子系统编辑器，名为Cascade。",[11,2026,2027,2028,174],{},"与通用的粒子系统设计一样，UE4的粒子系统由发射器产生粒子，并通过设置发射器和粒子的属性来实现不同的效果。在一个单一的粒子系统中，UE4可以同时添加多个发射器，通过组合可以实现非常炫丽的效果。在编辑器中，发射器的计算顺序是从左到右的，而模块的运算顺序是从上到下的。UE4的粒子系统同时支持LOD，以有效的控制粒子在场景中对运算量的消耗。系统中粒子也可以接收光照，只要使用材质时进行设定即可。当前文档中关于LOD上的bLit标签是有问题的，可参照",[21,2029,2032],{"href":2030,"rel":2031},"https:\u002F\u002Fanswers.unrealengine.com\u002Fquestions\u002F44995\u002Fwhere-is-blit-in-cascade.html",[25],"AnswerHub",[11,2034,2035],{},"和其他UE4的部分一样，大部分的属性都非常的易懂。但是将文档过一遍是很有必要的，这样才能知道系统都提供哪些功能，哪些是系统做不到的。",[38,2037,2039],{"id":2038},"particle-system-class","Particle System Class",[11,2041,2042],{},"粒子系统本身的属性，点击没有发射器的空白处就会出现。",[11,2044,2045],{},[468,2046,2047],{},"Particle System",[11,2049,2050],{},[45,2051,2052],{},"System Update Mode",[11,2054,2055],{},"粒子系统的更新模式，分为实时和固定两种，通常情况下使用实时即可。",[11,2057,2058],{},[45,2059,2060],{},"Update Time_FPS",[11,2062,2063],{},"固定时间模式下的步长设定。",[11,2065,2066],{},[45,2067,2068],{},"Warmup Time",[11,2070,2071],{},"预热时间。粒子系统初始时应该处于的时间，通常用于雾气等环境效果，保证游戏开始时粒子系统就处于完整的状态。会消耗一定的运算量。",[11,2073,2074],{},[45,2075,2076],{},"Warmup Tick Rate",[11,2078,2079],{},"系统预热步长。越低的数值精度越高，相反的，提高这个数值就能降低运算量消耗。0代表默认步长。",[11,2081,2082],{},[45,2083,2084],{},"Orient ZAxis Toward Camera",[11,2086,2087],{},"将粒子的Z轴锁定到摄像机。",[11,2089,2090],{},[45,2091,2092],{},"Seconds Before Inactive",[11,2094,2095],{},"当粒子系统不再被渲染时，经过多长时间才停止运算，0代表不停止。",[11,2097,2098],{},[468,2099,2100],{},"Thumbnail",[11,2102,2103],{},"内容浏览器的缩略图用属性，没有什么特别值得关注的地方。",[11,2105,2106],{},[468,2107,2108],{},"LOD",[11,2110,2111],{},"粒子系统的LOD相关属性。",[11,2113,2114],{},[45,2115,2116],{},"LOD Distance Check Time",[11,2118,2119],{},"检查粒子系统的距离的时间间隔，只有当LOD Method设定为自动时才起作用，用于自动切换LOD的显示。",[11,2121,2122],{},[45,2123,2124],{},"LOD Method",[11,2126,2127],{},"LOD的切换方式。Automatic为自动由距离决定，DirectSet为由代码进行调整，ActivateAutomatic为系统初始化时进行一次判定之后交由代码自行调整。",[11,2129,2130],{},[45,2131,2132],{},"LOD Distances",[11,2134,2135],{},"LOD级别的距离范围设定，每个数值代表当前等级的最大距离。",[11,2137,2138],{},[45,2139,2140],{},"LOD Settings",[11,2142,2143],{},"如开头所描述，由于当前Lit属性似乎不可用，这个属性当前也没有意义。",[11,2145,2146],{},[468,2147,2148],{},"Bounds",[11,2150,2151],{},"通过开关控制的边界盒体，由此决定当粒子不在视野中时不再对粒子系统进行运算，以降低系统消耗。",[11,2153,2154],{},"直接点击上方工具栏的『设置固定边界』，就会自动生成一个，然后在属性中可以手动进行微调。",[11,2156,2157],{},[60,2158],{"alt":62,"src":2159},"\u002Fwp-content\u002Fuploads\u002F2015\u002F06\u002Fimage_thumb4.png",[11,2161,2162],{},[468,2163,2164],{},"Delay",[11,2166,2167],{},"延迟，设置在调用ActivateSystem之后粒子系统延迟激活的时间。",[11,2169,2170],{},[45,2171,2164],{},[11,2173,2174],{},"延迟的时间。",[11,2176,2177],{},[45,2178,2179],{},"Delay Low",[11,2181,2182],{},"延迟的下限时间，需要下面的范围开关启动。",[11,2184,2185],{},[45,2186,2187],{},"Use Delay Range",[11,2189,2190,2191,2195],{},"延迟范围开关。打开之后延迟将会在",[2192,2193,2194],"span",{},"Delay Low ~ Delay","之间进行随机。",[11,2197,2198],{},[468,2199,2200],{},"Macro UV",[11,2202,2203],{},"中文名称不明。该UV贴图坐标用于将一个贴图平铺在所有的粒子上。",[11,2205,2206],{},[45,2207,2208],{},"MacroUVPosition",[11,2210,2211],{},"决定整个UV平铺的中心。",[11,2213,2214],{},[45,2215,2216],{},"MacroUVRadius",[11,2218,2219],{},"决定UV平铺的半径。",[11,2221,2222],{},[468,2223,2224],{},"Occlusion",[11,2226,2227],{},"遮蔽。",[11,2229,2230],{},[45,2231,2232],{},"Occlusion Bounds Method",[11,2234,2235],{},"遮蔽边界方式。None为不启用遮蔽，Particle Bounds为使用粒子系统定义的边界，Custom Bounds为自定义遮蔽边界。",[11,2237,2238],{},[45,2239,2240],{},"Custom Occlusion Bounds",[11,2242,2243],{},"自定义边界，调整时可以在视口中看到预览。",[11,2245,2246],{},[468,2247,2248],{},"Materials",[11,2250,2251],{},[45,2252,2253],{},"Named Materia Slots",[11,2255,2256],{},"可暴露给外界蓝图使用的材质参数插槽。",[38,2258,2260],{"id":2259},"particle-emitter-class","Particle Emitter Class",[11,2262,2263],{},"发射器的属性。",[11,2265,2266],{},[468,2267,1156],{},[11,2269,2270],{},[45,2271,2272],{},"Emitter Name",[11,2274,2275],{},"发射器名称",[11,2277,2278],{},[45,2279,2280],{},"Initial Allocation Count",[11,2282,2283],{},"当这个值不为0时，发射器将采用这个数值作为初始化粒子发射数。",[11,2285,2286],{},[45,2287,2288],{},"Quality Level Spawn Rate Scale",[11,2290,2291],{},"显示质量设置缩放比例，决定当系统的视频设置较低时的缩放比例，用于降低系统消耗。",[11,2293,2294],{},[45,2295,2296],{},"Detail Mode",[11,2298,2299],{},"发射器的显示精度，当系统的显示精度低于这个设置时，这个发射器将不会工作。",[11,2301,2302],{},[45,2303,2304],{},"Disabled LODs Keep Emitter Alive",[11,2306,2307],{},"当LOD为禁止状态时仍然保持发射器为激活状态。",[11,2309,2310],{},[468,2311,716],{},[11,2313,2314],{},"在编辑器中的显示设定。",[11,2316,2317],{},[45,2318,2319],{},"Emitter Render Mode",[11,2321,2322],{},"发射器的渲染模式。Normal为正常渲染，Point为近显示点，Cross为显示十字交叉线，Lights Only为仅光照，None为不显示。",[11,2324,2325],{},[45,2326,2327],{},"Emitter Editor Color",[11,2329,2330],{},"发射器在编辑器中的颜色。",[11,2332,2333],{},[45,2334,2335],{},"Collapsed",[11,2337,2338],{},"是否展开显示发射器。",[38,2340,2342],{"id":2341},"particle-module-class","Particle Module Class",[11,2344,2345],{},"粒子模块的基类，提供一些通用的属性。",[11,2347,2348],{},[468,2349,716],{},[11,2351,2352],{},[45,2353,2354],{},"3DDraw Mode",[11,2356,2357],{},"如果打开的话就会显示相应的辅助渲染信息。",[11,2359,2360],{},[45,2361,2362],{},"Module Editor Color",[11,2364,2365],{},"模块在编辑器中的颜色。",[38,2367,2369],{"id":2368},"typedata-modules","TypeData Modules",[11,2371,2372],{},"发射器的类型。添加时为默认的类型，可以通过添加类型数据进行修改。",[11,2374,2375],{},[60,2376],{"alt":62,"src":2377},"\u002Fwp-content\u002Fuploads\u002F2015\u002F06\u002Fimage_thumb5.png",[11,2379,2380],{},"可以添加的类型一共有五种，能够实现不同类型的粒子效果。",[11,2382,2383],{},"除了TypeData之外，还有很多其他的模块。作为对粒子发射器的控制被添加到粒子发射器上，以实现不同的粒子效果。",[38,2385,2387],{"id":2386},"required-module","Required Module",[11,2389,2390],{},"粒子发射器的一些基本属性在这个模块里进行设置。这个模块是必须的，无法手动删除。",[11,2392,2393],{},[468,2394,1148],{},[11,2396,2397],{},"发射器相关属性。",[11,2399,2400],{},[45,2401,2402],{},"Emitter Materia",[11,2404,2405],{},"粒子发射器发出的粒子所使用的材质。",[11,2407,2408],{},[45,2409,2410],{},"Emitter Origin",[11,2412,2413],{},"粒子发射器的发射起点。",[11,2415,2416],{},[45,2417,2418],{},"Emitter Rotation",[11,2420,2421],{},"发射粒子的初始旋转。",[11,2423,2424],{},[45,2425,2426],{},"Screen Alignment",[11,2428,2429],{},"粒子相对与摄像机的朝向。",[544,2431,2432,2440],{},[547,2433,2434],{},[550,2435,2436,2438],{},[553,2437],{},[553,2439],{},[558,2441,2442,2450,2458,2466,2474,2482],{},[550,2443,2444,2447],{},[563,2445,2446],{},"FacingCameraPosition",[563,2448,2449],{},"粒子旋转朝向摄像机位置（忽略摄像机选择）",[550,2451,2452,2455],{},[563,2453,2454],{},"Square",[563,2456,2457],{},"面向相机，使用X轴进行统一缩放",[550,2459,2460,2463],{},[563,2461,2462],{},"Rectangle",[563,2464,2465],{},"面向相机，非统一缩放",[550,2467,2468,2471],{},[563,2469,2470],{},"Velocity",[563,2472,2473],{},"朝向摄像机和粒子自身的运动方向，运行非统一缩放",[550,2475,2476,2479],{},[563,2477,2478],{},"Away From Center",[563,2480,2481],{},"背离中心方向",[550,2483,2484,2487],{},[563,2485,2486],{},"TypeSpecific",[563,2488,2489],{},"使用TypeData中的定义（仅Mesh类型可用）",[11,2491,2492],{},[45,2493,2494],{},"Use Local Space",[11,2496,2497],{},"是否使用本地空间或是使用父节点的坐标变换。",[11,2499,2500],{},[45,2501,2502],{},"Kill on Deactivate",[11,2504,2505],{},"是否在非活动时销毁粒子。",[11,2507,2508],{},[45,2509,2510],{},"Kill on Completed",[11,2512,2513],{},"是否在执行完成时销毁自身。",[11,2515,2516],{},[45,2517,170],{},[11,2519,2520],{},"排序模式。",[544,2522,2523,2531],{},[547,2524,2525],{},[550,2526,2527,2529],{},[553,2528],{},[553,2530],{},[558,2532,2533,2541,2549,2557,2565],{},[550,2534,2535,2538],{},[563,2536,2537],{},"PSORTMODE_None",[563,2539,2540],{},"不进行排序",[550,2542,2543,2546],{},[563,2544,2545],{},"PSORTMODE_ViewProjDepth",[563,2547,2548],{},"根据视图映射深度排序",[550,2550,2551,2554],{},[563,2552,2553],{},"PSORTMODE_DistanceToView",[563,2555,2556],{},"根据粒子到摄像机的距离排序",[550,2558,2559,2562],{},[563,2560,2561],{},"PSORTMODE_Age_OldestFirst",[563,2563,2564],{},"粒子的生存时间排序，最旧优先",[550,2566,2567,2570],{},[563,2568,2569],{},"PSORTMODE_Age_NewestFirst",[563,2571,2564],{},[11,2573,2574],{},[45,2575,2576],{},"Use Legacy Emitter Time",[11,2578,2579],{},"是否使用传统发射计时。传统发射计时采用EmitterDuration和SecondsSinceCreation来计算发射器时间，在循环或是变化时间粒子系统中可能会遇到问题。当不使用时，会使用新方法，利用DeltaTime来进行计算。",[11,2581,2582],{},[45,2583,2584],{},"Orbit Module Affects Velocity Align",[11,2586,2587],{},"当开启时，环绕模块所产生的影响将会应用到速度屏幕对齐（Screen Alignment： Velocity）的粒子上。",[11,2589,2590],{},[468,2591,2592],{},"Duration",[11,2594,2595],{},"时间间隔，发射器开始循环之前的间隔时间。",[11,2597,2598],{},[45,2599,2600],{},"Emitter Duration",[11,2602,2603],{},"发射器进入循环前的间隔时间，为0则不循环。",[11,2605,2606],{},[45,2607,2608],{},"Emitter Duration Low",[11,2610,2611],{},"发射器间隔低值，需要下面的开关打开才有效。",[11,2613,2614],{},[45,2615,2616],{},"Emitter Duration Use Range",[11,2618,2619,2620,2623],{},"间隔时间范围开关。当打开时间隔时间将在",[2192,2621,2622],{},"Emitter Duration~Emitter Duration Low","之间随机。",[11,2625,2626],{},[45,2627,2628],{},"Duration Recalc Each Loop",[11,2630,2631],{},"每一次循环完成后都会重新计算间隔时间",[11,2633,2634],{},[45,2635,2636],{},"Emitter Loops",[11,2638,2639],{},"发射器循环次数，为0则永久循环。",[11,2641,2642],{},[468,2643,2164],{},[11,2645,2646],{},[45,2647,2648],{},"Emitter Delay",[11,2650,2651],{},"延迟时间。与Duartion不同的是，Delay的期间发射器是不发射粒子的。",[11,2653,2654],{},[45,2655,2656],{},"Emitter Delay Low",[11,2658,2659],{},"延迟时间低值，需要下面的开关打开才有效。",[11,2661,2662],{},[45,2663,2664],{},"Emitter Delay Use Range",[11,2666,2667,2668,2623],{},"延迟范围开关。打开后延迟将会在",[2192,2669,2670],{},"Emitter Delay~Emitter Delay Low",[11,2672,2673],{},[45,2674,2675],{},"Delay First Loop Only",[11,2677,2678],{},"仅在第一次循环前延迟",[11,2680,2681],{},[468,2682,2010],{},[11,2684,2685,2686,174],{},"Sub UV属性是针对Sub UV模块的，详情可以参考这里：",[21,2687,2688],{"href":115},"SubUV模块属性及应用",[11,2690,2691],{},[45,2692,2693],{},"Interpolation Method",[11,2695,2696],{},"插值方法。",[544,2698,2699,2707],{},[547,2700,2701],{},[550,2702,2703,2705],{},[553,2704],{},[553,2706],{},[558,2708,2709,2716,2724,2732,2740],{},[550,2710,2711,2713],{},[563,2712,639],{},[563,2714,2715],{},"不在应用SubUV功能",[550,2717,2718,2721],{},[563,2719,2720],{},"Linear(线性)",[563,2722,2723],{},"按照子图像顺序进行线性的过渡，但是与下一张图像不混合",[550,2725,2726,2729],{},[563,2727,2728],{},"Linear_Blend (线性_混合)",[563,2730,2731],{},"按照子图像顺序进行线性的过渡，与下一张图像进行混合",[550,2733,2734,2737],{},[563,2735,2736],{},"Random(随机)",[563,2738,2739],{},"下一张子图像随机的抽取，但是与下一张图像不混合",[550,2741,2742,2745],{},[563,2743,2744],{},"Random_Blend(随机_混合)",[563,2746,2747],{},"下一张子图像随机的抽取，与下一张图像进行混合",[11,2749,2750],{},[45,2751,2752],{},"Sub Images Horizontal",[11,2754,2755],{},"贴图X轴上的子图像数量。",[11,2757,2758],{},[45,2759,2760],{},"Sub Images Vertical",[11,2762,2763],{},"贴图Y轴上的子图像数量。",[11,2765,2766],{},[45,2767,2768],{},"Scale UV",[11,2770,2771],{},"UV缩放的比例。",[11,2773,2774],{},[45,2775,2776],{},"Random Image Chagnes",[11,2778,2779],{},"粒子生命周期中随机图像的变换次数。",[11,2781,2782],{},[468,2783,2200],{},[11,2785,2786],{},"与粒子系统的Macro UV属性类似。",[11,2788,2789],{},[468,2790,679],{},[11,2792,2793],{},[45,2794,2795],{},"Use Max Draw Count",[11,2797,2798],{},"是否使用最大绘制次数限制",[11,2800,2801],{},[45,2802,2803],{},"Max Draw Count",[11,2805,2806],{},"最大绘制次数的限定值",[11,2808,2809],{},[45,2810,2811],{},"UVFlipping Mode",[11,2813,2814],{},"所有粒子的UV翻转模式 。",[544,2816,2817,2825],{},[547,2818,2819],{},[550,2820,2821,2823],{},[553,2822],{},[553,2824],{},[558,2826,2827,2835,2843,2851,2859,2867,2875],{},[550,2828,2829,2832],{},[563,2830,2831],{},"Flip UV",[563,2833,2834],{},"翻转UV",[550,2836,2837,2840],{},[563,2838,2839],{},"Flip Uonly",[563,2841,2842],{},"翻转U",[550,2844,2845,2848],{},[563,2846,2847],{},"Flip Vonly",[563,2849,2850],{},"翻转V",[550,2852,2853,2856],{},[563,2854,2855],{},"Random Flip UV",[563,2857,2858],{},"随机翻转UV",[550,2860,2861,2864],{},[563,2862,2863],{},"Random Flip Uonly",[563,2865,2866],{},"随机翻转U",[550,2868,2869,2872],{},[563,2870,2871],{},"Random Flip Vonly",[563,2873,2874],{},"随机翻转V",[550,2876,2877,2880],{},[563,2878,2879],{},"Random Flip UV Independent",[563,2881,2882],{},"随机翻转UV（UV相互独立）",[11,2884,2885],{},[468,2886,2887],{},"Normals",[11,2889,2890],{},[45,2891,2892],{},"Emitter Normals Mode",[11,2894,2895],{},"发射器法线的计算模式",[544,2897,2898,2906],{},[547,2899,2900],{},[550,2901,2902,2904],{},[553,2903],{},[553,2905],{},[558,2907,2908,2916,2924],{},[550,2909,2910,2913],{},[563,2911,2912],{},"ENM_CameraFacing",[563,2914,2915],{},"默认模式，法线由朝向几何体的摄像机生成",[550,2917,2918,2921],{},[563,2919,2920],{},"ENM_Spherical",[563,2922,2923],{},"以Normals Sphere Center为中心的球体来生成法线",[550,2925,2926,2929],{},[563,2927,2928],{},"ENM_Cylindrical",[563,2930,2931],{},"以穿过Normal Sphere Center并以NormalsCylinderDirection为方向的圆柱体来生成法线。",[11,2933,2934],{},[45,2935,2936],{},"Normals Sphere Center",[11,2938,2939],{},"法线生成中根据选项不同会用到的参数。",[11,2941,2942],{},[45,2943,2944],{},"Normals Cylinder Direction",[11,2946,2939],{},[11,2948,2949],{},[45,2950,2951],{},"Materias",[11,2953,2954],{},"Named Materia Overrides",[11,2956,2957],{},"指定材质插槽名称，以替换发射器使用的材质。插槽中的材质则可以通过蓝图进行设置。",[38,2959,2961],{"id":2960},"spawn","Spawn",[11,2963,2964],{},"这也是一个必须的模块，无法删除。用于设定粒子是如何发射出去的。",[11,2966,2967],{},[468,2968,2961],{},[11,2970,2971],{},[45,2972,2973],{},"Rate",[11,2975,2976],{},"每秒中产生粒子的个数。",[11,2978,2979],{},[45,2980,2981],{},"Rate Scale",[11,2983,2984],{},"发射速率缩放系数。",[11,2986,2987],{},[45,2988,2989],{},"Apply Global Spawn Rate Scale",[11,2991,2992],{},"如果打开此开关，那么发射器的缩放因子将会受到全局设定中的r.EmitterSpawnRateScale数值影响。",[11,2994,2995],{},[45,2996,2997],{},"Process Spawn Rate",[11,2999,3000],{},"打开之后才会处理Rate的设置，当发射器中有多个Spawn时，其中任何一个关闭这个选项都将导致Rate不被处理。",[11,3002,3003],{},[468,3004,3005],{},"Burst",[11,3007,3008],{},"爆发。在给定时间内强制发射一定数量的粒子。",[11,3010,3011],{},[45,3012,3013],{},"Particle Burst Method",[11,3015,3016],{},"粒子爆发方式。",[544,3018,3019,3027],{},[547,3020,3021],{},[550,3022,3023,3025],{},[553,3024],{},[553,3026],{},[558,3028,3029,3037],{},[550,3030,3031,3034],{},[563,3032,3033],{},"Instant",[563,3035,3036],{},"立即",[550,3038,3039,3042],{},[563,3040,3041],{},"Intepolated",[563,3043,3044],{},"插值",[11,3046,3047],{},[45,3048,3049],{},"Burst List",[11,3051,3052],{},"粒子爆发参数列表，用于指定时间和粒子爆发。数组元素的属性有三个。",[544,3054,3055,3063],{},[547,3056,3057],{},[550,3058,3059,3061],{},[553,3060],{},[553,3062],{},[558,3064,3065,3073,3081],{},[550,3066,3067,3070],{},[563,3068,3069],{},"Count",[563,3071,3072],{},"爆发的粒子个数",[550,3074,3075,3078],{},[563,3076,3077],{},"Count Low",[563,3079,3080],{},"爆发的粒子下限个数，为-1时则无作用",[550,3082,3083,3086],{},[563,3084,3085],{},"Time",[563,3087,3088],{},"爆发的时间点",[11,3090,3091],{},[45,3092,3093],{},"Burst Scale",[11,3095,3096],{},"爆发的缩放因子。",[11,3098,3099],{},[45,3100,3101],{},"Process Burst List",[11,3103,3104],{},"打开之后才会处理Burst List，发射器中任何一个Spawn模块没有打开这个开关，就会导致Burst List不被处理。",[11,3106,3107],{},[468,3108,716],{},[11,3110,3111],{},"通用的编辑器属性。",[409,3113],{},[11,3115,3116],{},"至此，粒子系统部分的主要属性算是整理了一遍。但是还有大量的模块和粒子类型没有进行研究，基本的参数含义在只是知道含义的情况下也没什么用。因此决定接下来从实践的角度对粒子系统进行研究。",{"title":200,"searchDepth":201,"depth":202,"links":3118},[3119,3120,3121,3122,3123,3124],{"id":2038,"depth":202,"text":2039},{"id":2259,"depth":202,"text":2260},{"id":2341,"depth":202,"text":2342},{"id":2368,"depth":202,"text":2369},{"id":2386,"depth":202,"text":2387},{"id":2960,"depth":202,"text":2961},"2015-06-30",{"layout":215,"status":216,"published":217,"author":3127,"author_login":219,"author_email":220,"author_url":221,"wordpress_id":3128,"wordpress_url":3129,"date_gmt":3130,"excerpt":3131},{"display_name":219,"login":219,"email":220,"url":221},1319,"\u002F\u002F?p=1319","2015-06-30 03:30:50 +0000",{"type":8,"value":3132},[3133],[11,3134,2019],{},"\u002F2015-06-30-ue4-particle-basics",{"title":2014,"description":2019},"_legacy\u002F2015\u002F2015-06-30-ue4-particle-basics",[233,234],"yj_Ij1vsLYIcuPNLxkOsLmGjTNtay4B73uXQDAbRbCk",85,1788763178384]